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Influence of sputtering rate on nanopatterning of crystalline silicon surfaces by low-energy ion beam erosion

J.A. Sánchez-García, L. Vázquez, R. Gago, O. Plantevin, T.H. Metzger, J. Munoz-Garcia, M. Castro, R. Cuerno


Nanopatterning via ions, photon beam and epitaxy, Sestri Levante, Genoa (Italy). 23-27 September 2007

Publication date: September 2007.



Citation:
J.A. Sánchez-García, L. Vázquez, R. Gago, O. Plantevin, T.H. Metzger, J. Munoz-Garcia, M. Castro, R. Cuerno, Influence of sputtering rate on nanopatterning of crystalline silicon surfaces by low-energy ion beam erosion, Nanopatterning via ions, photon beam and epitaxy. Sestri Levante, Italy, 23-27 September 2007


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