19th International Conference on Ion Implantation Technology, Valladolid (Spain). 25-29 Junio 2012
Publication date: June 2012.
Citation:
Moreno Barrado, A., Castro, M., Cumulative stress by ion implantation of Xe+. Si: A Molecular Dynamics approach, 19th International Conference on Ion Implantation Technology, Valladolid (Spain). 25-29 June 2012.
