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Conference paper information

Cumulative stress by ion implantation of Xe+. Si: A Molecular Dynamics approach

A. Moreno Barrado, M. Castro


19th International Conference on Ion Implantation Technology

Publication date: June 2012.



Citation:
A. Moreno Barrado, M. Castro, Cumulative stress by ion implantation of Xe+. Si: A Molecular Dynamics approach, 19th International Conference on Ion Implantation Technology. ISBN: 978-0-7354-1108-1, Valladolid, Spain, 25-29 June 2012


    Research topics:
  • *Mechanical systems: Structural mechanics, Machinery components, Fast prototyping, Metrology