Workshop on Nanopatterning via ions, photon beam and epitaxy, Sestri Levante (Italy). 23-27 September 2007
Publication date: 23-Sep-2007.
Citation:
J.A. Sánchez-García, L. Vázquez, R. Gago, O. Plantevin, T.H. Metzger, J. Muñoz-Garcia, M. Castro, R. Cuerno, "Influence of sputtering rate on nanopatterning of crystalline silicon surfaces by low-energy ion beam erosion", presented at Workshop on Nanopatterning via ions, photon beam and epitaxy, Sestri Levante, Italy, 23-27 September 2007
