Conference paper information

Cumulative stress by ion implantation of Xe+. Si: A Molecular Dynamics approach

A. Moreno Barrado, M. Castro

19th International Conference on Ion Implantation Technology - IIIT, Valladolid (Spain). 25-29 June 2012

Publication date: 25-Jun-2012.

Citation:
A. Moreno Barrado, M. Castro, "Cumulative stress by ion implantation of Xe+. Si: A Molecular Dynamics approach", presented at 19th International Conference on Ion Implantation Technology - IIIT, Valladolid, Spain, 25-29 June 2012

Research topics:

*Mechanical Systems: Structural mechanics, Machinery components, Fast prototyping, Metrology

Research groups:

Instituto de Investigación Tecnológica (IIT)

IIT-12-218C_poster