International Symposium on Nanoscale Pattern Formation at Surfaces, Copenhagen (Denmark). 26-30 Mayo 2013
Publication date: May 2013.
Citation:
Moreno Barrado, A., Castro, M., Molecular dynamics of ion beam implantation of xenon, argon and silicon in crystalline silicon, International Symposium on Nanoscale Pattern Formation at Surfaces, Copenhagen (Denmark). 26-30 May 2013.
IIT-13-051A
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