Special issue on surfaces patterned by ion sputtering

J. Muñoz-Garcia, R. Cuerno, M. Castro, L. Vázquez, R. Gago, A. Redondo-Cubero

Journal of Physics: Condensed Matter Vol. 30, nº. 45, pp. 450301-1 - 450301-3

Resumen:

Scalable nanostructuring of surfaces using ion beam sputtering (IBS) is a versatile alternative to traditional lithography. Semiconductors, metals or compounds are amenable for IBS where different patterns can be obtained by tuning the experimental setup. This special issue addresses this problem in a wide range of topics, from a basic understanding of the physical mechanisms operating at the nanoscale, to practical applications, with a synergetic approach coming from theoretical as well as experimental groups.

Índice de impacto JCR y cuartil WoS: 2,711 - Q2 (2018); 2,700 - Q3 (2022)

Referencia DOI: https://doi.org/10.1088/1361-648X/aae608

Publicado en papel: Noviembre 2018.

Publicado on-line: Octubre 2018.

Cita:
J. Muñoz-Garcia, R. Cuerno, M. Castro, L. Vázquez, R. Gago, A. Redondo-Cubero, Special issue on surfaces patterned by ion sputtering. Journal of Physics: Condensed Matter. Vol. 30, nº. 45, pp. 450301-1 - 450301-3, Noviembre 2018. [Online: Octubre 2018]