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Special issue on surfaces patterned by ion sputtering

J. Munoz-Garcia, R. Cuerno, M. Castro, L. Vázquez, R. Gago, A. Redondo-Cubero

Scalable nanostructuring of surfaces using ion beam sputtering (IBS) is a versatile alternative to traditional lithography. Semiconductors, metals or compounds are amenable for IBS where different patterns can be obtained by tuning the experimental setup. This special issue addresses this problem in a wide range of topics, from a basic understanding of the physical mechanisms operating at the nanoscale, to practical applications, with a synergetic approach coming from theoretical as well as experimental groups.


Journal of Physics: Condensed Matter. Volumen: 30 Numero: 45 Páginas: 450301-1-450301-3

Journal Impact Factor: JCR impact factor 2.617 (2017)

DOI reference: DOI icon 10.1088/1361-648X/aae608    

Publicado en papel: Octubre 2018. Publicado on-line: Octubre 2018.

    Líneas de investigación:
  • Nanotecnología
  • Modelado numérico

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