Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering

A. Redondo-Cubero, J.A. Sánchez-García, R. Gago, L. Vázquez, J. Munoz-Garcia, M. Castro, R. Cuerno

Nanopatterning via ions, photon beam and epitaxy, Sestri Levante (Italy). 23-27 Septiembre 2007

Publication date: September 2007.

Citation:
Redondo-Cubero, A., Sánchez-García, J.A., Gago, R., Vázquez, L., Munoz-Garcia, J., Castro, M., Cuerno, R., Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering, Nanopatterning via ions, photon beam and epitaxy, Sestri Levante (Italy). 23-27 September 2007.