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Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering

A. Redondo-Cubero, J.A. Sánchez-García, R. Gago, L. Vázquez, J. Munoz-Garcia, M. Castro, R. Cuerno


Nanopatterning via ions, photon beam and epitaxy

Publication date: September 2007.



Citation:
A. Redondo-Cubero, J.A. Sánchez-García, R. Gago, L. Vázquez, J. Munoz-Garcia, M. Castro, R. Cuerno, Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering, Nanopatterning via ions, photon beam and epitaxy. Sestri Levante, Italy, 23-27 September 2007


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