Go top
Conference paper information

Molecular dynamics of ion beam implantation of xenon, argon and silicon in crystalline silicon

A. Moreno Barrado, M. Castro


International Symposium on Nanoscale Pattern Formation at Surfaces, Copenhagen (Denmark). 26-30 May 2013

Publication date: May 2013.



Citation:
A. Moreno Barrado, M. Castro, Molecular dynamics of ion beam implantation of xenon, argon and silicon in crystalline silicon, International Symposium on Nanoscale Pattern Formation at Surfaces. Copenhague, Denmark, 26-30 May 2013


    Research topics:
  • *Mechanical systems: Structural mechanics, Machinery components, Fast prototyping, Metrology

IIT-13-051A

Aviso legal  |  Política de cookies |  Poítica de Privacidad

© Universidad Pontificia Comillas, Escuela Técnica Superior de Ingeniería - ICAI, Instituto de Investigación Tecnológica

Calle de Santa Cruz de Marcenado, 26 - 28015 Madrid, España - Tel: (+34) 91 5422 800