Nanopatterning via ions, photon beam and epitaxy, Sestri Levante (Italy). 23-27 Septiembre 2007
Publication date: September 2007.
Citation:
Sánchez-García, J.A., Vázquez, L., Gago, R., Plantevin, O., Metzger, T.H., Munoz-Garcia, J., Castro, M., Cuerno, R., Influence of sputtering rate on nanopatterning of crystalline silicon surfaces by low-energy ion beam erosion, Nanopatterning via ions, photon beam and epitaxy, Sestri Levante (Italy). 23-27 September 2007.
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